Dienstag, 15. März 2016

Control of residual stresses in nanostructured thin films by microstructural design - workshop held by Ass. Prof. Rostislav Daniel

After the successful workshop on mechanical residual stresses in PECVD / PVD deposited thin films at the Laser Zentrum Hannover (LZH), on March 10th Ass. Prof. Rostislav Daniel from the Montanuniversität Leoben held a more detailed workshop on the topic at the Chair of Materials Chemistry (RWTH Aachen).

The workshop was addressed to starters as well as to advanced scientists and the audience included doctorals, postdoctorals, students and professors.
Ass. Prof. Daniel who is working at the Department of Physical Metallurgy and Materials Testing, introduced his listeners to the basics of residual stresses and gave an overview over his measuring results. Residual stresses in thin films affect their performance in terms of adhesion, mechanical properties and stability especially while the coated components are mechanically and
thermally loaded. 
The knowledge of the origin of stresses in thin films at the nano- and macro-scale is thus crucial in controlling the stress state of these materials and in enhancement of their reliability in various applications. For this reason among many, attending Ass. Prof. Daniel's workshop was a good opportunity for SFB scientists and others.