Publikationen

2022

Hoppe, Christian; Mitschker, Felix; Mai, Lukas; Liedke, Maciej Oskar; Arcos, Teresa; Awakowicz, Peter et al. (2022): Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin films on PDMS. In Plasma Processes & Polymers,

https://doi.org/10.1002/ppap.202100174

2021

de los Arcos, Teresa; Müller, Hendrik; Wang, Fuzeng; Damerla, Varun Raj; Hoppe, Christian; Weinberger, Christian et al. (2021): Review of infrared spectroscopy techniques for the determination of internal structure in thin SiO2 films. In VIBRATIONAL SPECTROSCOPY 114, p. 103256,

https://doi.org/10.1016/j.vibspec.2021.103256

"On the justification of the Poisson-Boltzmann equation in the context of technological plasmas" Kevin Köhn, Dennis Krüger, Efe Kemaneci, Liang Xu, Denis Eremin and Ralf Peter Brinkmann, Plasma Sources Sci. Technol. 30 105014 (2021), (https://doi.org/10.1088/1361-6595/ac278b)
Liang Xu, Denis Eremin, and Ralf Peter Brinkmann, "Direct evidence of gradient drift instability being the origin of a rotating spoke in a crossed field plasma",Plasma Sources Sci. Technol. 30 075013 (2021), (https://doi.org/10.1088/1361-6595/ac0487)

E. Evdochenko, J. Kamp, R. Dunkel, V.V. Nikonenko, M. Wessling, Charge distribution in polyelectrolyte multilayer nanofiltration membranes affects ion separation and scaling propensity,
Journal of Membrane Science, Volume 636, 2021, 119533, ISSN 0376-7388, https://doi.org/10.1016/j.memsci.2021.119533

Soheil Karimi Aghda, Denis Music, Yeliz Unutulmazsoy, Heng Han Sua, Stanislav Mráz, Marcus Hans, Daniel Primetzhofer, André Anders, Jochen M. Schneider, Unravelling the ion-energy-dependent structure evolution and its implications for the elastic properties of (V,Al)N thin films,
Acta Materialia, Volume 214, 2021, 117003, ISSN 1359-6454, https://doi.org/10.1016/j.actamat.2021.117003
Holger Rueß, Jonas Werner, Yeliz Unutulmazsoy, Jürgen W. Gerlach, Xiang Chen, Bastian Stelzer, Denis Music, Szilard Kolozsvari, Peter Polcik, Thomas E. Weirich, Jochen M. Schneider,
Effect of target peak power density on the phase formation, microstructure evolution, and mechanical properties of Cr2AlC MAX-phase coatings, Journal of the European Ceramic Society, Volume 41, Issue 3, 2021, Pages 1841-1847, ISSN 0955-2219, https://doi.org/10.1016/j.jeurceramsoc.2020.10.072
Soheil Karimi Aghda, Denis Music, Yeliz Unutulmazsoy, Heng Han Sua, Stanislav Mráz, Marcus Hans, Daniel Primetzhofer, André Anders, Jochen M. Schneider, Unravelling the ion-energy-dependent structure evolution and its implications for the elastic properties of (V,Al)N thin films, Acta Materialia, Volume 214, 2021, 117003, ISSN 1359-6454, https://doi.org/10.1016/j.actamat.2021.117003
Holger Rueß, Jonas Werner, Yeliz Unutulmazsoy, Jürgen W. Gerlach, Xiang Chen, Bastian Stelzer, Denis Music, Szilard Kolozsvari, Peter Polcik, Thomas E. Weirich, Jochen M. Schneider,
Effect of target peak power density on the phase formation, microstructure evolution, and mechanical properties of Cr2AlC MAX-phase coatings, Journal of the European Ceramic Society, Volume 41, Issue 3, 2021, Pages 1841-1847, ISSN 0955-2219, https://doi.org/10.1016/j.jeurceramsoc.2020.10.072
Babak Bakhit, Stanislav Mráz, Jun Lu, Johanna Rosen, Jochen M. Schneider, Lars Hultman, Ivan Petrov, Grzegorz Greczynski, Dense Ti0.67Hf0.33B1.7 thin films grown by hybrid HfB2-HiPIMS/TiB2-DCMS co-sputtering without external heating, Vacuum, Volume 186, 2021, 110057, ISSN 0042-207X, https://doi.org/10.1016/j.vacuum.2021.110057
Johannes Kamp, Stephan Emonds, Julian Borowec, Maria Adelaida Restrepo Toro, Matthias Wessling, On the organic solvent free preparation of ultrafiltration and nanofiltration membranes using polyelectrolyte complexation in an all aqueous phase inversion process, Journal of Membrane Science, Volume 618, 2021, 118632, ISSN 0376-7388, https://doi.org/10.1016/j.memsci.2020.118632

2020

Hoppe, C.; Mitschker, F.; Butterling, M.; Liedke, M. O.; de los Arcos, T.; Awakowicz, P. et al. (2020): Characterisation of micropores in plasma deposited SiO x films by means of positron annihilation lifetime spectroscopy. In JOURNAL OF PHYSICS D-APPLIED PHYSICS 53 (47), p. 475205, https://doi.org/10.1088/1361-6463/aba8ba
J. Held, S. Thiemann-Monjé, A. von Keudell, V. Schulz-von der Gathen, 2020. Velocity distribution of metal ions in the target region of HiPIMS: the role of Coulomb collisions. Plasma Sources Science and technology 29, 125003. http://dx.doi.org/10.1088/1361-6595/abbf94
Sida Liu, Keke Chang, Denis Music, Xiang Chen, Stanislav Mráz, Dimitri Bogdanovski, Marcus Hans, Daniel Primetzhofer, Jochen M. Schneider, Stress-dependent prediction of metastable phase formation for magnetron-sputtered V1−xAlxN and Ti1−xAlxN thin films, Acta Materialia,
Volume 196, 2020, Pages 313-324, ISSN 1359-6454, https://doi.org/10.1016/j.actamat.2020.06.044
J. Held, P. A. Maaß, V. Schulz-von der Gathen, A. von Keudell, 2020. Electron density, temperature and the potential structure of spokes in HiPIMS. Plasma Sources Sci. Technol. 29, 025006. https://doi.org/10.1088/1361-6595/ab5e46

2019

Zanders, David; Ciftyurek, Engin; Hoppe, Christian; de los Arcos, Teresa; Kostka, Aleksander; Rogalla, Detlef et al. (2019): Validation of a Terminally Amino Functionalized Tetra-Alkyl Sn(IV) Precursor in Metal-Organic Chemical Vapor Deposition of SnO2 Thin Films. Study of Film Growth Characteristics, Optical, and Electrical Properties. In ADVANCED MATERIALS INTERFACES 6 (1), https://doi.org/10.1002/admi.201801540
Mai, Lukas; Zanders, David; Subasi, Ersoy; Ciftyurek, Engin; Hoppe, Christian; Rogalla, Detlef et al. (2019): Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor. Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices. In ACS APPLIED MATERIALS & INTERFACES 11 (3), pp. 3169–3180, https://doi.org/10.1021/acsami.8b16443
Mai, Lukas; Boysen, Nils; Zanders, David; de los Arcos, Teresa; Mitschker, Felix; Mallick, Bert et al. (2019): Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide. In CHEMISTRY-A EUROPEAN JOURNAL 25 (31), pp. 7489–7500, https://doi.org/10.1002/chem.201900475
Hans, M.; Patterer, L.; Music, D.; Holzapfel, D.M.; Evertz, S.; Schnabel, V.; Stelzer, B.; Primetzhofer, D.; Völker, B.; Widrig, B.; Eriksson, A.O.; Ramm, J.; Arndt, M.; Rudigier, H.; Schneider, J.M. Stress-Dependent Elasticity of TiAlN Coatings. Coatings 2019, 9, 24. https://doi.org/10.3390/coatings9010024
Keuter, P.; Karimi Aghda, S.; Music, D.; Kümmerl, P.; Schneider, J.M. Synthesis of Intermetallic (Mg_1−x,Al_x)₂Ca by Combinatorial Sputtering. Materials 2019, 12, 3026. https://doi.org/10.3390/ma12183026
Kirchheim, D., Wilski, S., Jaritz, M., Mitschker, F., Oberberg, M., Trieschmann, J., Banko, L., Brochhagen, M., Schreckenberg, R., Hopmann, C., Böke, M., Benedikt, J., de los Arcos, T., Grundmeier, G., Grochla, D., Ludwig, A., Mussenbrock, T., Brinkmann, R.P., Awakowicz, P., Dahlmann, R., 2019. Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD. J Coat Technol Res 16, 573–583. https://doi.org/10.1007/s11998-018-0138-4
Sida Liu, Keke Chang, Stanislav Mráz, Xiang Chen, Marcus Hans, Denis Music, Daniel Primetzhofer, Jochen M. Schneider, Modeling of metastable phase formation for sputtered Ti1-xAlxN thin films, Acta Materialia, Volume 165, 2019, Pages 615-625, ISSN 1359-6454, https://doi.org/10.1016/j.actamat.2018.12.004
Krüger, F., Gergs, T., Trieschmann, J., 2019. Machine learning plasma-surface interface for coupling sputtering and gas-phase transport simulations. Plasma Sources Sci. Technol. 28, 035002. https://doi.org/10.1088/1361-6595/ab0246
Schmidt, F., Trieschmann, J., Gergs, T., Mussenbrock, T., 2019. A generic method for equipping arbitrary rf discharge simulation frameworks with external lumped element circuits. Journal of Applied Physics 125, 173106. https://doi.org/10.1063/1.5091965

2018

Hoppe, C.; Mitschker, F.; Awakowicz, P.; Kirchheim, D.; Dahlmann, R.; de los Arcos, T.; Grundmeier, G. (2018): Adhesion of plasma-deposited silicon oxide barrier layers on PDMS containing polypropylene. In SURFACE & COATINGS TECHNOLOGY 335, pp. 25–31, https://doi.org/10.1016/j.surfcoat.2017.12.015
Layes, Vincent; Corbella, Carles; Monje, Sascha; Schulz-von der Gathen, Volker; Keudell, Achim von; de los Arcos, Teresa (2018): Connection between target poisoning and current waveforms in reactive high-power impulse magnetron sputtering of chromium. In PLASMA SOURCES SCIENCE & TECHNOLOGY 27 (8), https://doi.org/10.1088/1361-6595/aad0e2
Mai, Lukas; Boysen, Nils; Subasi, Ersoy; de los Arcos, Teresa; Rogalla, Detlef; Grundmeier, Guido et al. (2018): Water assisted atomic layer deposition of yttrium oxide using tris(N,N’-diisopropyl-2dimethylamido-guanidinato) yttrium(III). Process development, film characterization and functional properties. In RSC ADVANCES 8 (9), pp. 4987–4994, https://doi.org/10.1039/c7ra13417g
Mitschker, F.; Schuecke, L.; Hoppe, Ch; Jaritz, M.; Dahlmann, R.; de los Arcos, T. et al. (2018): Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO). In JOURNAL OF PHYSICS D-APPLIED PHYSICS 51 (23), https://doi.org/10.1088/1361-6463/aac0ab
Mitschker, F.; Wissing, J.; Hoppe, Ch; de los Arcos, T.; Grundmeier, G.; Awakowicz, P. (2018): Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET. In JOURNAL OF PHYSICS D-APPLIED PHYSICS 51 (14), https://doi.org/10.1088/1361-6463/aab1dd
Wiesing, M.; de los Arcos, T.; Gebhard, M.; Devi, A.; Grundmeier, G. (2018): Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy. In PHYSICAL CHEMISTRY CHEMICAL PHYSICS 20 (1), pp. 180–190, https://doi.org/10.1039/c7cp05373h
Wiesing, M.; de los Arcos, T.; Grundmeier, G. (2018): UHV AFM based colloidal probe studies of adhesive properties of VAlN hard coatings. In APPLIED SURFACE SCIENCE 428, pp. 767–774, https://doi.org/10.1016/j.apsusc.2017.09.208
Gebhard, Maximilian; Mai, Lukas; Banko, Lars; Mitschker, Felix; Hoppe, Christian; Jaritz, Montgomery et al. (2018): PEALD of SiO2 and Al2O3 Thin Films on Polypropylene. Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. In ACS APPLIED MATERIALS & INTERFACES 10 (8), pp. 7422–7434, https://doi.org/10.1021/acsami.7b14916
Dietrich, J.; Hoppe, C.; de los Arcos, T.; Grundmeier, G. (2018): Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiOx on polypropylene. In CONTRIBUTIONS TO PLASMA PHYSICS 58 (5, SI), pp. 377–383, https://doi.org/10.1002/ctpp.201700036
Budde, Maik; Corbella, Carles; Grosse-Kreul, Simon; de los Arcos, Teresa; Grundmeier, Guido; Keudell, Achim von (2018): Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas. In PLASMA PROCESSES AND POLYMERS 15 (4), https://doi.org/10.1002/ppap.201700230
Trieschmann, J., 2018. Neutral gas simulation on the influence of rotating spokes on gas rarefaction in high-power impulse magnetron sputtering. Contributions to Plasma Physics 58, 394, https://doi.org/10.1002/ctpp.201700062
Wilczek, S., Trieschmann, J., Schulze, J., Donkó, Z., Brinkmann, R.P., Mussenbrock, T., 2018. Disparity between current and voltage driven capacitively coupled radio frequency discharges. Plasma Sources Sci. Technol. 27, 125010. https://doi.org/10.1088/1361-6595/aae5c1
J. Trieschmann, S. Ries, N. Bibinov, P. Awakowicz, S. Mráz, J. M. Schneider & T. Mussenbrock. "Combined experimental and theoretical description of direct current magnetron sputtering of Al by Ar and Ar/N 2 plasma", Plasma Sources Science and Technology, 27, 054003. doi: 10.1088/1361-6595/aac23e (2018)
D. Krüger, J. Trieschmann & R. P. Brinkmann. "Scattering of magnetized electrons at the boundary of low temperature plasmas", Plasma Sources Science and Technology 27, 025011. doi: 10.1088/1361-6595/aaaa85 (2018)
Dennis Kirchheim, Stefan Wilski, Montgomery Jaritz, Felix Mitschker, Moritz Oberberg, Jan Trieschmann, Lars Banko, Markus Brochhagen, Rabea Schreckenberg, Christian Hopmann, Marc Böke, Jan Benedikt, Teresa de los Arcos, Guido Grundmeier, Dario Grochla, Alfred Ludwig, Thomas Mussenbrock, Ralf Peter Brinkmann, Peter Awakowicz, Rainer Dahlmann. "Improved Homogeneity of Plasma and Coating Properties Using a Lance Matrix Gas Distribution in MW-PECVD." Accepted at Journal of Coatings Technology and Research, https://doi.org/10.1007/s11998-018-0138-4
Frederik Schmidt, Thomas Mussenbrock, and Jan Trieschmann. 2018. "Consistent Simulation of Capacitive Radio-Frequency Discharges and External Matching Networks." Plasma Sources Science and Technology 27 (10): 105017, https://doi.org/10.1088/1361-6595/aae429
Frederik Schmidt, Julian Schulze, Erik Johnson, Jean-Paul Booth, Douglas Keil, David M. French, Jan Trieschmann, and Thomas Mussenbrock. 2018. "Multi Frequency Matching for Voltage Waveform Tailoring." Plasma Sources Science and Technology 27 (9): 095012. https://doi.org/10.1088/1361-6595/aad2cd
Jan Trieschmann, and Thomas Mussenbrock. 2018. "Kinetic Bandgap Analysis of Plasma Photonic Crystals." Journal of Applied Physics 124 (17): 173302, https://doi.org/10.1063/1.5055282
Sebastian Wilczek, Jan Trieschmann, Julian Schulze, Zoltan Donko, Ralf Peter Brinkmann, and Thomas Mussenbrock. 2018. "Disparity between Current and Voltage Driven Capacitively Coupled Radio Frequency Discharges." Accepted at Plasma Sources Science and Technology, https://doi.org/10.1088/1361-6595/aae5c1
Dennis Kirchheim, Stefan Wilski, Montgomery Jaritz, Felix Mitschker, Moritz Oberberg, Jan Trieschmann, Lars Banko, Markus Brochhagen, Rabea Schreckenberg, Christian Hopmann, Marc Böke, Jan Benedikt, Teresa de los Arcos, Guido Grundmeier, Dario Grochla, Alfred Ludwig, Thomas Mussenbrock, Ralf Peter Brinkmann, Peter Awakowicz, Rainer Dahlmann. "Improved Homogeneity of Plasma and Coating Properties Using a Lance Matrix Gas Distribution in MW-PECVD." Accepted at Journal of Coatings Technology and Research, https://doi.org/10.1007/s11998-018-0138-4
Frederik Schmidt, Thomas Mussenbrock, and Jan Trieschmann. 2018. "Consistent Simulation of Capacitive Radio-Frequency Discharges and External Matching Networks." Plasma Sources Science and Technology 27 (10): 105017, https://doi.org/10.1088/1361-6595/aae429
Frederik Schmidt, Julian Schulze, Erik Johnson, Jean-Paul Booth, Douglas Keil, David M. French, Jan Trieschmann, and Thomas Mussenbrock. 2018. "Multi Frequency Matching for Voltage Waveform Tailoring." Plasma Sources Science and Technology 27 (9): 095012, https://doi.org/10.1088/1361-6595/aad2cd
Jan Trieschmann, and Thomas Mussenbrock. 2018. "Kinetic Bandgap Analysis of Plasma Photonic Crystals." Journal of Applied Physics 124 (17): 173302. https://doi.org/10.1063/1.5055282
Sebastian Wilczek, Jan Trieschmann, Julian Schulze, Zoltan Donko, Ralf Peter Brinkmann, and Thomas Mussenbrock. 2018. "Disparity between Current and Voltage Driven Capacitively Coupled Radio Frequency Discharges." Accepted at Plasma Sources Science and Technology, https://doi.org/10.1088/1361-6595/aae5c1
B. Berger, K.H. You, H.C. Lee, T. Mussenbrock, P. Awakowicz, J. Schulze. "Observation of the generation of multiple electron beams during a single sheath expansion phase in capacitive RF plasmas." Plasma Sources Science and Technology (2018, accepted)
Dennis Krüger, Kevin Köhn, Sara Gallian, and Ralf Peter Brinkmann. "Reconstruction of the static magnetic field of a magnetron." Physics of Plasmas 25, 061207 (2018)
Nils Boysen, Tim Hasselmann, Sarah Karle, Detlef Rogalla, Detlef Theirich, Manuela Winter, Thomas Riedl, Anjana Devi: Ein N-heterocyclischer Carbenkomplex des Silbers für die plasmaunterstützte räumlich getrennte Atomlagenabscheidung dünner Silberschichten bei Atmosphärendruck, in: Angewandte Chemie, 2018, DOI: 10.1002/ange.201808586

2017

Corbella, Carles; Marcak, Adrian; Keudell, Achim von; de los Arcos, Teresa (2017): Electric potential screening on metal targets submitted to reactive sputtering. In JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 35 (2), https://doi.org/10.1116/1.4972566
Hoppe, C.; Mitschker, F.; Giner, I.; de los Arcos, T.; Awakowicz, P.; Grundmeier, G. (2017): Influence of organic surface chemistry on the nucleation of plasma deposited SiOx films. In JOURNAL OF PHYSICS D-APPLIED PHYSICS 50 (20), https://doi.org/10.1088/1361-6463/aa69e5
Layes, V.; Monje, S.; Corbella, C.; Trieschmann, J.; de los Arcos, T.; Keudell, A. von (2017): Species transport on the target during high power impulse magnetron sputtering. In APPLIED PHYSICS LETTERS 110 (8), https://doi.org/10.1063/1.4976999
Layes, Vincent; Monje, Sascha; Corbella, Carles; Schulz-von der Gathen, Volker; Keudell, Achim von; de los Arcos, Teresa (2017): Composite targets in HiPIMS plasmas. Correlation of in-vacuum XPS characterization and optical plasma diagnostics. In JOURNAL OF APPLIED PHYSICS 121 (17), https://doi.org/10.1063/1.4977820
Mai, Lukas; Gebhard, Maximilian; de los Arcos, Teresa; Giner, Ignacio; Mitschker, Felix; Winter, Manuela et al. (2017): Unearthing [3-(Dimethylamino)propyl] aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3. Synthesis, Characterization and ALD Process Development. In CHEMISTRY-A EUROPEAN JOURNAL 23 (45), pp. 10768–10772, https://doi.org/10.1002/chem.201702939
Mitschker, F.; Steves, S.; Gebhard, M.; Rudolph, M.; Schuecke, L.; Kirchheim, D. et al. (2017): Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence. In JOURNAL OF PHYSICS D-APPLIED PHYSICS 50 (23), https://doi.org/10.1088/1361-6463/aa6e28
Wiesing, M.; de los Arcos, T.; Baben, M. To; Ruess, H.; Schneider, J. M.; Grundmeier, G. (2017): Analysis of the inhibition of thermal degradation of molten polycarbonate at tool steel interfaces by thin TiAlN coatings. In POLYMER DEGRADATION AND STABILITY 143, pp. 196–206, https://doi.org/10.1016/j.polymdegradstab.2017.07.013
Wiesing, Martin; de los Arcos, Teresa; Grundmeier, Guido (2017): The Thermal Oxidation of TiAlN High Power Pulsed Magnetron Sputtering Hard Coatings as Revealed by Combined Ion and Electron Spectroscopy. In ADVANCED MATERIALS INTERFACES 4 (5), https://doi.org/10.1002/admi.201600861
J. Trieschmann. "Neutral Gas Simulation on the Influence of Rotating Spokes on Gas Rarefaction in High-Power Impulse Magnetron Sputtering", Accepted at Contributions to Plasma Physics (2017), https://doi.org/10.1002/ctpp.201700062
M. to Baben, M. Hans, D. Primetzhofer, S. Evertz, H. Ruess, J. M. Schneider, Unprecedented thermal stability of inherently metastable (Ti,Al)N by point defect engineering, Material Research Letters 5, 158-169 (2017)
C. Corbella, A. Marcak, T. de los Arcos, and A. von Keudell, Electric potential screening on metal targets submitted to reactive sputtering, Journal of Vacuum Science and Technology A 35 (2017) 021307
M. Daksha, A. Derzsi, S. Wilczek, J. Trieschmann, T. Mussenbrock, P. Awakowicz, Z. Donkó, J. Schulze, The effect of realistic heavy particle induced secondary electron emission coefficients on the electron power absorption dynamics in single- and dual-frequency capacitively coupled plasmas. Plasma Sources Science and Technology 26, 85006 (2017)
G. Greczynski, S. Mráz, M. Hans, D. Primetzhofer, J. Lu, L. Hultman, J. M. Schneider,Unprecedented Al supersaturation in single-phase rock salt structure VAlN films by Al⁺subplantation, Journal of Applied Physics 121, 171907 (2017)
A. Hecimovic, C. Corbella, C. Maszl, W. Breilmann, and A. von Keudell, Investigation of plasma spokes in reactive high power impulse magnetron sputtering discharge, Journal of Applied Physics 121 (2017) 171915
D. Holec, L. Zhou, H. Riedl, C. M. Koller, P. H. Mayrhofer, M. Friák, M. Šob, F. Körmann, J. Neugebauer, D. Music, M. A. Hartmann, F. D. Fischer, Atomistic modeling-based design ofnovel materials, Advanced Engineering Materials 19, 1600688 (2017)
O. Hunold, P. Keuter, P. Bliem, D. Music., F. Wittmers, A. L. Ravensburg, D. Primetzhofer, J.M. Schneider, Elastic properties of amorphous T0.75Y0.75B14 (T = Sc, Ti, V, Y, Zr, Nb) and the effect of O incorporation on bonding, density and elasticity (T´ = Ti, Zr), Journal of Physics: Condensed Matter 29, 085404 (2017)
A. von Keudell and C. Corbella, Review Article: Unraveling synergistic effects in plasma-surface processes by means of beam experiments, Journal of Vacuum Science and Technology A 35 (2017) 050801
D. Krüger, and R.P. Brinkmann: Interaction of Magnetized Electrons with a Boundary Sheath: Investigation of a Specular Reflection Model, Plasma Sources Science and Technology 26, no. 11 (2017): 115009, https://doi.org/10.1088/1361-6595/aa9248
V. Layes, S. Monje, C. Corbella, V. Schulz-von der Gathen, A. von Keudell, and T. de los Arcos, Composite targets in HiPIMS plasmas: correlation of in-vacuum XPS characterization and optical plasma diagnostics, Journal of Applied Physics 121 (2017) 171912
V. Layes, S. Monje, C. Corbella, J. Trieschmann, T. de los Arcos, and A. von Keudell, Species transport on the target during high power impulse magnetron sputtering, Applied Physics Letters 110 (2017) 081603
D. Music, L. Banko, H. Ruess, M. Engels, A. Hecimovic, D. Grochla, D. Rogalla, T. Brögelmann, A. Ludwig, A. von Keudell, K. Bobzin, J. M. Schneider, Correlative plasma-surface model for metastable Cr-Al-N: Frenkel pair formation and influence of the stress state on the elastic properties, Journal of Applied Physics 121, 215108 (2017)
J. Trieschmann, T. Mussenbrock, Kinetic analysis of negative power deposition in inductive low pressure plasmas, Plasma Sources Science and Technology 26, 24004 (2017)
J. Trieschmann, F. Schmidt, T. Mussenbrock, Particle‐in‐Cell/Test‐Particle Simulations of Technological Plasmas: Sputtering Transport in Capacitive Radio Frequency Discharges, Plasma Processes and Polymers 14, 1600140 (2017)
M. Shihab, T. Mussenbrock Kinetic Investigation of the Ion Angular Distribution in Capacitive Radio-Frequency Plasmas Physics of Plasmas 24, 113510 (2017)
B. Berger, T. Steinberger, E. Schuengel, M. Koepke, T. Mussenbrock, P. Awakowicz, J. Schulze Enhanced Power Coupling Efficiency in Inductive Discharges with RF Substrate Bias Driven at Consecutive Harmonics with Adjustable Phase Applied Physics Letters 111, 201601 (2017)
D. Eremin, R.P. Brinkmann, T. Mussenbrock Observations of Surface Mode Influence on Plasma Uniformity in PIC/MCC Simulations of Large Capacitive Discharges Plasma Processes and Polymers 14, 1600164 (2017)

2016

Corbella, Carles; Marcak, Adrian; de los Arcos, Teresa; Keudell, Achim von (2016): Revising secondary electron yields of ion-sputtered metal oxides. In JOURNAL OF PHYSICS D-APPLIED PHYSICS 49 (16), https://doi.org/10.1088/0022-3727/49/16/16LT01
Gebhard, M.; Mitschker, F.; Wiesing, M.; Giner, I.; Torun, B.; de los Arcos, T. et al. (2016): An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor. In JOURNAL OF MATERIALS CHEMISTRY C 4 (5), pp. 1057–1065, https://doi.org/10.1039/c5tc03385c
K. Bobzin, T. Brögelmann, N.C. Kruppe, M. Arghavani, Verformungsverhalten nanostrukturierter HPPMS-Hartstoffschichten, Vakuum in Forschung und Praxis, Vol. 28, Nr. 3, 18-25 (2016)
C. Corbella, A. Marcak, T. de los Arcos, and A. von Keudell, Revising seconary electron yields of ion-sputtered metal oxides, Journal of Physics D: Applied Physics 49 (2016) 16LT01
D. Eremin, S. Bienholz, D. Szeremley, J. Trieschmann, S. Ries, P. Awakowicz, T. Mussenbrock, und R. P. Brinkmann, On the Physics of a Large CCP Discharge, Plasma Sources Science and Technology 25, 2, 025020, doi:10.1088/0963-0252/25/2/025020 (2016)
M. Gebhard, F. Mitschker, M. Wiesing, I. Giner, B. Torun, T. de los Arcos, P. Awakowicz, G. Grundmeier and A. Devi, An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor, Journal of Materials Chemistry C 4, 1057 (2016)
G. Greczynski, S. Mráz, L. Hultman, J. M. Schneider, Unintentional carbide formation evidenced during high-vacuum magnetron sputtering of transition metal nitride thin films, Applied Surface Science 385, 356-359 (2016)
G. Greczynski, S. Mráz, L. Hultman, J. M. Schneider, Venting temperature determines surface chemistry of magnetron sputtered TiN films, Applied Physics Letters 108, 041603 (2016)
M. Hans, M. to Baben, Y.-T. Chen, K. G. Pradeep, D. M. Holzapfel, D. Primetzhofer, D. Kurapov, J. Ramm, M. Arndt, H. Rudigier, J. M. Schneider, Substrate rotation-induced chemical modulation in Ti-Al-O-N coatings synthesized by cathodic arc in an industrial deposition plant, Surface and Coatings Technology 305, 249-253 (2016)
Hecimovic, Anomalous cross-B field transport and spokes in HiPIMS plasma, Journal of Physics D: Applied Physics 49, 18LT01 (2016)
Hecimovic, C. Maszl, V. Schulz-von der Gathen, M. Böke, and A. von Keudell, Spokes rotation reversal in magnetron discharges of aluminium, chromium and titanium, Plasma Sources Science Technology 25, 035001, doi:10.1088/0963-0252/25/3/035001 (2016)
O. Hunold, Y.-T. Chen, D. Music, P. O. Å. Persson, D. Primetzhofer, M. to Baben, J.-O. Achenbach, P. Keuter, J. M. Schneider, Correlative theoretical and experimental investigation of the formation of AlYB14 and competing phases, Journal of Applied Physics 119, 085307 (2016)
O. Hunold, M. Wiesing, T. de los Arcos, D. Music, G. Grundmeier, J. M. Schneider, Influence of O₂exposure on the interaction between CH₄ and amorphous AIYB₁₄, Applied Surface Science 392, 1165-1172 (2016)
O. Hunold, D. Music, J. M. Schneider, Theoretical study of phase stability and elastic properties of T _0.75 Y _0.75B₁₄ (T = Sc, Ti, V, Y, Zr, Nb, Si), Journal of Physics: Condensed Matter 28, 105501 (2016)
Kanitz, A. Hecimovic, M. Böke, and J. Winter, Two dimensional spatial Argon metastable dynamics in a HiPIMS discharges, Journal of Physics D: Applied Physics 49, 125203, doi:10.1088/0022-3727/49/12/125203 (2016)
von Keudell, A. Hecimovic, C. Maszl, “Gepulste Hochleistungs-Magnetron-Plasmen (HPPMS) Kontrolle durch Überwachung der Strom-Spannungskennlinien“, Vakuum in Forschung und Praxis 28, 24 (2016)
D. Kirchheim, M. Jaritz, R. Dahlmann, Ch. Hopmann, Wirkmechanismen bei der Barriereausrüstung von Kunststoffen mit Hilfe von PECVD, Vakuum in Forschung und Praxis 28, 1, 36–41, DOI: 10.1002/vipr.201600603 (2016)
D. Music, R. W. Geyer, J. M. Schneider, Recent progress and new directions in density functional theory based design of hard coatings, Surface and Coatings Technology 286, 178-190 (2016)
M. Wiesing, M. to Baben, J. M. Schneider, T. de los Arcos, G. Grundmeier, “Combined Electrochemical and Electron Spectroscopic Investigations on the Surface Oxidation of TiAlN HPPMS Hard Coatings, Paper accepted (minor revisions) in Electrochimica Acta
S. Wilczek, J. Trieschmann, D. Eremin, R. P. Brinkmann, J. Schulze, E. Schuengel, A. Derzsi, I. Korolov, P. Hartmann, Z. Donkó, T. Mussenbrock, Kinetic interpretation of resonance phenomena in low pressure capacitively coupled radio frequency plasmas. Physics of Plasmas 23, 63514 (2016)

2015

Grundmeier, Guido; Keudell, Achim von; de los Arcos, Teresa (2015): Fundamentals and Applications of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes at Materials Interfaces. In PLASMA PROCESSES AND POLYMERS 12 (9, SI), pp. 926–940, https://doi.org/10.1002/ppap.201500087
Marcak, Adrian; Corbella, Carles; de los Arcos, Teresa; Keudell, Achim von (2015): Note. Ion-induced secondary electron emission from oxidized metal surfaces measured in a particle beam reactor. In REVIEW OF SCIENTIFIC INSTRUMENTS 86 (10), https://doi.org/10.1063/1.4932309
H. Bahre, H. Behm, D. Grochla, M. Böke, R. Dahlmann, C. Hopmann, A. Ludwig, J. Winter, Film Stress of Amorphous Hydrogenated Carbon on Biaxially Oriented Polyethylene Terephthalate, Plasma Processes und Polymers (2015), DOI: 10.1002/ppap.201500045K.
K. Bobzin, T. Brögelmann, R. H. Brugnara, Aluminum-rich HPPMS (Cr1-xAlx)N Coatings Deposited with Different Target Compositions and at Various Pulse Lengths, Vacuum (2015)
K. Bobzin, T. Brögelmann, R. H. Brugnara, S. Chromy, Analysis of Ion Energy Distribution at the Substrate during a HPPMS (Cr,Al)N Process using Retarding Field Energy Analyzer and Energy Resolved Mass Spectrometer, Thin Solid Films (2015)
K. Bobzin, T. Brögelmann, R. H. Brugnara, N. Kruppe, S. Chromy, Influence of HPPMS Pulse Parameters on the Reactive gas N2 and on the Properties of (Cr,Al)N Coatings, Surface and Coatings Technology (2015)
K. Bobzin, T. Brögelmann, R. H. Brugnara, M. Arghavani, T-S. Yang, Y-Y. Chang, S-Y. Chang, Investigation on Plastic Behavior of HPPMS CrN, AlN and CrN/AlN-Multilayer Coatings using Finite Element Simulation and Nanoindentation, Surface and Coatings Technology 284, 310-317 (2015)
K. Bobzin K, T. Brögelmann, R. H. Brugnara, M. Arghavani, T-S. Yang, Y-Y. Chang, S-Y. Chang, Investigation on Plastic Behavior of HPPMS CrN, AlN and CrN/AlN-Multilayer Coatings using Finite Element Simulation and Nanoindentation, Surface and Coatings Technology (2015)
W. Breilmann, A. Eitrich, C. Maszl, A. Hecimovic, V. Layes, J. Benedikt, A. von Keudell, High power impulse sputtering of chromium: correlation between the energy distribution of chromium ions and spoke formation, Journal of Physics D: Applied Physics 48, 295202 (2015)
Bulusu, S. Graham, H. Bahre, H. Behm, M. Böke, R. Dahlmann, Ch. Hopmann, J. Winter, The mechanical behavior of ALD-polymer hybrid films under tensile strain, Advanced Engineering Materials 17, 7, DOI: 10.1002/adem.201400431 (2015)
Corbella, S. Große-Kreul, A. von Keudell, Exploring the Structure of the Modified Top Layer of Polypropylene During Plasma Treatment, Plasma Processes and Polymers 12, 564 (2015)
S. Gallian, J. Trieschmann, T. Mussenbrock, R. P. Brinkmann, W. N. G. Hitchon, Analytic model of the energy distribution function for highly energetic electrons in magnetron plasmas, Journal of Applied Physics 117, 023305 (2015)
G. Grundmeier, A. von Keudell and T. de los Arcos, Fundamentals and Applications of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes at Materials Interfaces, Plasma Processes and Polymers (early view), DOI: 10.1002/ppap.201500087 (2015)
Hecimovic, V. Schulz-von der Gathen, M. Böke, A. von Keudell, J. Winter, Spoke transitions in HiPIMS discharges, Plasma Sources Science and Technology 24, 45005 (2015)
F. Mitschker, J. Dietrich, B. Ozkaya, T. de los Arcos, I. Giner, P. Awakowicz, G. Grundmeier, Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer Surface-Near Regions During the Deposition of SiOx Films, Plasma Processes and Polymers 12, DOI: 10.1002/ppap.201500085 (2015)
A. Marcak, C. Corbella, T. de los Arcos, and A. von Keudell, Note: Ion-induced secondary electron emission from oxidized metal surfaces measured in a particle beam reactor, Review of Scientific Instruments 86 (2015) 106102
S. Monje, C. Corbella, and A. von Keudell, Elementary surface processes during reactive magnetron sputtering of chromium, Journal of Applied Physics 118 (2015) 133301
D. Music, R. W. Geyer, J. M. Schneider, Recent progress and new directions in density functional theory based design of hard coatings, Surface and Coatings Technology 286, 178–190, DOI: 10.1016/j.surfcoat.2015.12.021 (2016)
B. Ozkaya, F. Mitschker, O. Ozcan, P. Awakowicz, G. Grundmeier, Inhibition of interfacial oxidative degradation during SiOx plasma polymer barrier film deposition on model organic substrates, Plasma Processes and Polymers 12 (4), (2015) 392-397
S. Rezaei, S. Wulfinghoff, S. Reese, Prediction of the fracture behavior in nano-laminated structures using a cohesive zone element technique, Proceedings of the 3rd ECCOMAS Young Investigators Conference on Computational Methods in Applied Sciences and 6th GACM Colloquium on Computational Mechanics, submitted (May 15, 2015)
S. Rezaei, S. Wulfinghoff, R. Kebriaei, S. Reese, Application of a cohesive zone element for the prediction of damage in nano/micro coating, Proceedings in Applied Mathematics and Mechanics, Wiley, submitted (May 28, 2015)
J. Trieschmann, T. Mussenbrock, Transport of Sputtered Particles in Capacitive Sputter Sources, Journal of Applied Physics 118, 033302 (2015)
S. Wilczek, J. Trieschmann, J. Schulze, E. Schuengel, R. P. Brinkmann, A. Derzsi, I. Korolov, Z. Donkó, T. Mussenbrock, The effect of the driving frequency on the confinement of beam electrons and plasma density in low-pressure capacitive discharges. Plasma Sources Science and Technology 24, 24002 (2015)
S. Wulfinghoff, S. Reese, M. Fassin, Y. Kiliclar, T. Brepols, S. Rezaei, Properties and Restrictions related to Anisotropic Damage Theories based on 2nd Order Damage Tensors, Proceedings of the 3rd ECCOMAS Young Investigators Conference on Computational Methods in Applied Sciences and 6th GACM Colloquium on Computational Mechanics, submitted (May 3, 2015)

2014

N. Bagcivan, K. Bobzin, A. Ludwig, D. Grochla, R. H. Brugnara: CrN/AlN Nanolaminate Coatings Deposited via High Power Pulsed and Middle Frequency Pulsed Magnetron Sputtering, Thin Solid Films 572, 153-160 (2014).
N. Bagcivan, K. Bobzin, T. Brögelmann, C. Kalscheuer: Development of (Cr,Al)ON coatings using middle frequency magnetron sputtering and investigations on tribological behavior against polymers, Surface and Coatings Technology, 260, 347-361 (2014)
N. Bagcivan, K. Bobzin, R. H. Brugnara, Nitride and Oxy-Nitride PVD Coatings for Application in Plastics Processing, Proceedings of 11th THE-A-Coatings Conference, Thessaloniki, 79-86 (2014)
H. Behm, K. Bahroun, H. Bahre, D. Kirchheim, F. Mitschker, N. Bibinov, M. Böke, R. Dahlmann, P. Awakowicz, Ch. Hopmann, J. Winter, Adhesion of thin CVD Films on pulsed plasma pre-treated polypropylene, Plasma Processes and Polymers 11, 5, 418-425 (2014)
S. Bienholz, T Styrnoll, P. Awakowicz, On the electrical asymmetry effect in large area multiple frequency capacitively coupled plasmas, Journal of Physics D: Applied Physics 47, 065201 (2014)
K. Bobzin, N. Bagcivan, S. Theiß, J. Trieschmann, R. H. Brugnara, S. Preissing, A. Hecimovic, Influence of Ar/Kr ratio and pulse parameters in a Cr-N HPPMS process on plasma and coating properties, Journal of Vacuum Science and Technology A 32, 021513 (2014)
K. Bobzin, N. Bagcivan, T. Brögelmann, R.H. Brugnara, HPPMS-Beschichtungen metallischer Komponenten für die Kunststoffverarbeitung, GAK Fachmagazin für die Polymerindustrie 10, 616-621 (2014)
T. de los Arcos et al., Description of HiPIMS plasma regimes in terms of composition, spoke formation and deposition rate, Plasma Sources Science Technology 23, 054008 (2014)
M. Hans, M. to Baben, D. Music, J. Ebenhöch, D. Primetzhofer, D. Kurapov, M. Arndt, H. Rudigier, J. M. Schneider, Effect of oxygen incorporation on the structure and elasticity of Ti-Al-O-N coatings synthesized by cathodic arc and high power pulsed magnetron sputtering, Journal of Applied Physics 116, 093515 (2014)
A. Hecimovic, M. Böke, J. Winter, The characteristic shape of emission profiles of plasma spokes in HiPIMS: the role of secondary electrons, Journal of Physics D: Applied Physics 47, 102003 (2014)
D. Kirchheim, R. Dahlmann, Ch. Hopmann, K. Bahroun, H. Behm, Elongation properties of multilayer PECVD barrier coatings on PET films, Journal of Plastics Technology 10, 4, 142-159 (2014)
C. Kunze, D. Music, M. to Baben, J.M. Schneider, G. Grundmeier, Temporal evolution of oxygen chemisorption on TiAlN, Applied Surface Science 290, 504 (2014)
B. Ozkaya, H. Bahre, M. Böke, D. Höwer, S. Reese, J. Winter, G. Grundmeier, Electrochemical analysis of strain-induced crack formation of bilayer barrier plasma polymer films on metal and polymer substrates, Surface and Coatings Technology 244, 173-179 (2014)
S. Siepa, S. Danko, T. V Tsankov, T. Mussenbrock, U. Czarnetzki, On the OES line-ratio technique in argon and argon-containing plasmas, Journal of Physics D: Applied Physics 47, 445201 (2014)
S. Schröter, H. Bahre, M. Böke, J. Winter, The Role of Argon Metastables in an Inductively Coupled Plasma for Treatment of PET, Plasma Processes and Polymers 11, 239-246 (2014)

2013

T. de los Arcos, V. Layes, Y. Aranda Gonzalvo, V. Schulz-von der Gathen, A. Hecimovic, J. Winter, Current-voltage characteristics and fast imaging of HPPMS plasmas: transition from self-organized to homogeneous plasma regimes, Journal of Physics. D: Applied Physics 46, 335201 (2013)
P. Awakowicz and U. Czarnetzki, Pulsed high-power plasmas for deposition of nanostructured thin films, Journal of Physics D: Applied Physics 46, 080301 (2013)
M. to Baben, L. Raumann, J.M. Schneider, Phase stability and elastic properties of titanium aluminum oxynitride studied by ab initio calculations, Journal of Physics D: Applied Physics 46, 084002 (2013)
N. Bagcivan, K. Bobzin, G. Grundmeier, C. Kunze, R. H. Brugnara, Influence of HPPMS Pulse Length and Inert Gas mixture on the Properties of (Cr,Al)N Coatings, Thin Solid Films 549, 192-198 (2013)
N. Bagcivan, K. Bobzin, R. H. Brugnara, Investigation of the Properties of Low Temperature (Cr1-xAlx)N Coatings Deposited via Hybrid PVD DC-MSIP/HPPMS, Materials Science and Engineering Technology 44 (8), 667-672 (2013)
N. Bagcivan, K. Bobzin, S. Theiß, Synthesis of nano-structured HPPMS CrN/AlN coatings, Journal of Physics D: Applied Physics 46, 084001 (2013)
H. Bahre, K. Bahroun, H. Behm, S. Steves, P. Awakowicz, M. Böke, Ch. Hopmann, J. Winter, Surface pre-treatment for barrier coatings on polyethylene terephthalate, Journal of Physics D: Applied Physics 46, 084012 (2013)
S. Bienholz, N. Bibinov, P. Awakowicz, Multiple frequency capacitively coupled plasmas as a new technology for sputter processes, Journal of Physics D: Applied Physics 46, 084010 (2013)
K. Bobzin, N. Bagcivan, S. Theiß, R. H. Brugnara, J. Perne, Approach to determine stress strain curves by FEM supported nanoindentation, Materials Science and Engineering Technology, 44, No. 6, 571–576 (2013)
K. Bobzin, N. Bagcivan, R.H. Brugnara, M. Schäfer, R.P. Brinkmann, T. Mussenbrock, J. Trieschmann, Continuum and Kinetic Simulations of the Neutral Gas Flow in an Industrial Physical Vapor Deposition Reactor, Surface and Coatings Technology 237, 176-181 (2013)
K. Bobzin, N. Bagcivan, S. Theiß, J. Perne, Flow curve determination on dc-MS and HPPMS CrAlN coatings, Journal of Physics D: Applied Physics 46, 084006 (2013)
K. Bobzin, N. Bagcivan, S. Theiß, R. H. Brugnara, J. Perne, Flow Curve Determination of Thin Films by Improved Finite Element Models and Different Nanoindenter Geometries, Thin Solid Films 549, 313-320 (2013)
C. Corbella, S. Grosse-Kreul, O. Kreiter, T. de los Arcos, J. Benedikt, A. von Keudell, Particle beam experiments for the analysis of reactive sputtering processes in metals and polymer surfaces, Review of Scientific Instruments 84, 103303 (2013)
S. Gallian, W.N.G. Hitchon, D. Eremin, T. Mussenbrock, R.P. Brinkmann, A phenomenological model for the description of rotating spokes in HiPIMS discharges, Plasma Sources Science and Technology 22, 055012 (2013)
C. Gnoth, C. Kunze, M. Hans, M. to Baben, J. Emmerlich, J.M. Schneider, G. Grundmeier, Surface chemistry of TiAlN and TiAlNO coatings deposited by means of high power pulsed magnetron sputtering, Journal of Physics D: Applied Physics 46, 084003 (2013)
J. Emmerlich, N. Thieme, M. to Baben, D. Music, and J.M. Schneider, Stability, elastic properties and fracture toughness of Al_0.75X_0.75B₁₄ (X D Sc, Ti, V, Cr, Y, Zr, Nb, Mo) investigated using ab initio calculations Journal of Physics: Condensed Matter 25, 335501 (2013)
D. Eremin, T. Hemke, R. P. Brinkman, T. Mussenbrock, Simulations of electromagnetic effects in high-frequency capacitively coupled discharges using the Darwin approximation, Journal of Physics D: Applied Physics 46, 084017 (2013)
C. Kunze, R.H. Brugnara, N. Bagcivan, K. Bobzin, G. Grundmeier, Surface chemistry of PVD (Cr,Al)N coatings deposited by means of direct current and high power pulsed magnetron sputtering, Surface and Interface Analysis 45, 1884-1892 (2013)
C.-N. Liu, B. Ozkaya, S. Steves, P. Awakowicz, G. Grundmeier, Combined in situ FTIR-spectroscopic and electrochemical analysis of nanopores in ultra-thin SiOx-like plasma polymer barrier films, Journal of Physics D: Applied Physics 46, 084015 (2013)
D. Music, F. Henslinga, T. Pazur, J. Bednarcik, M. Hans, V. Schnabel, C. Hostert, J.M. Schneider, Bonding and elastic properties of amorphous AlYB₁₄, Solid State Communications 169, 6 (2013)
D. Music, J.M. Schneider, Ab initio study of Ti_0.5Al_0.5N(001)—residual and environmental gas interactions, New Journal of Physics 15, 073004 (2013)
M. Prenzel, A. Kortmann, A. von Keudell, F. Nahif, J.M. Schneider, M. Shihab, R.P. Brinkmann, Formation of crystalline γ-Al2O3 induced by variable substrate biasing during reactive magnetron sputtering, Journal of Physics D: Applied Physics 46, 084004 (2013)
S.J. Rotert, D. Music, M. to Baben, J.M. Schneider, Theoretical study of elastic properties and phase stability of M_0.5Al_0.5N_1-xO_x (M=Sc, Ti, V, Cr), Journal of Applied Physics 113, 083512 (2013)
T. Schlebrowski, H. Bahre, M. Böke, and J. Winter, Monitoring particle growth in deposition plasmas, Plasma Sources Science and Technology 22, 065014 (2013)
K.P. Shaha, H. Rueß, S. Rotert, M. to Baben, D. Music, J.M. Schneider, Nonmetal sublattice population induced defect structure in transition metal aluminum oxynitrides, Applied Physics Letters 103, 221905 (2013)
S. Steves, T. Styrnoll, F. Mitschker, S. Bienholz, N. Bibinov, P. Awakowicz, Characterization of low-pressure microwave and radio frequency discharges in oxygen applying optical emission spectroscopy and multipole resonance probe, Journal of Physics D: Applied Physics 46, 445201 (2013)
S. Steves, B. Ozkaya, C.-N. Liu, O. Ozcan, N. Bibinov, G. Grundmeier, P. Awakowicz, Silicon oxide barrier films deposited on PET foils in pulsed plasmas: influence of substrate bias on deposition process and film properties, Journal of Physics D: Applied Physics 46, 084013 (2013)
J. Trieschmann, M. Shihab, D. Szeremley, A. E. Elgendy, S. Gallian, D. Eremin, R. P. Brinkman, T. Mussenbrock, Ion energy distribution functions behind the sheaths of magnetized and non-magnetized radio frequency discharges, Journal of Physics D: Applied Physics 46, 084016 (2013)
M.M. Turner, A. Derzsi, Z. Donko, D. Eremin, S.J. Kelly, T. Lafleur, T. Mussenbrock, Simulation Benchmarks for Low Pressure Plasmas: Capacitive Discharge, Physics of Plasmas 20, 013507 (2013)
A. Will, T. de los Arcos, C. Corbella, A. Hecimovic, P. D Machura, J. Winter, A. von Keudell, Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum, Journal of Physics D: Applied Physics 46, 084009 (2013)
J. Winter, A. Hecimovic, T. de los Arcos, M. Böke,V. Schulz-von der Gathen, Instabilities in high-power impulse magnetron plasmas: from stochasticity to periodicity, Journal of Physics D: Applied Physics 46, 084007 (2013)

2012

M. to Baben, L.Raumann, D. Music, J.M. Schneider, Origin of the nitrogen over- and understoichiometry in Ti0:5Al0:5N thin ﬁlms, Journal of Physics: Condensed Matter 24, 155401 (2012)
N. Bagcivan, K. Bobzin, S. Theiß, Comparison of (Cr0.75Al0.25)N Coatings Deposited by Conventional and High Power Pulsed Magnetron Sputtering, Contributions to Plasma Physics, 52, 7, 599 (2012)
S. Bienholz, E. Semmler, P. Awakowicz, H. Brunken, A. Ludwig, Dual frequency capacitive plasmas in Fe and Ni sputter applications: correlation of discharge properties on thin film properties, Plasma Sources Science and Technology 21, 015010 (2012)
K. Bobzin, N. Bagcivan, S. Theiß, (Cr1-xAlx)N: A Comparison of Direct Current, Middle Frequency Pulsed and High Power Pulsed Magnetron Sputtering for Injection Molding Components, accepted for publication in Thin Soid Films
A.P. Ehiasarian, A. Hecimovic, T. de los Arcos, R. New, V. Schulz-von der Gathen, M Böke, J. Winter, High Power Impulse Magnetron sputtering discharges: Instabilities and plasma self-organisation. Applied Physics Letters 100, 114101 (2012)
A. Hecimovic, T. de los Arcos, V. Schulz-von der Gathen, M. Böke, J. Winter, Temporal evolution of the radial plasma emissivity profile in HIPIMS plasma discharge, Plasma Sources Science and Technology 21, 035017 (2012)
D. Music, D. Lange, L. Raumann, M. to Baben, F. von Fragstein, J.M. Schneider, Polypropylene–MAlN (M=Ti, Cr) interface interactions, Surface Science 606, 986 (2012)
T. Mussenbrock, Modeling and simulation of ion energy distribution functions in technological plasmas, Contributions to Plasma Physics 52, 571 (2012)
Marina Prenzel, Teresa de los Arcos, Annika Kortmann, Jörg Winter, Achim von Keudell, Embedded argon as a tool for sampling local structure in thin plasma deposited aluminum oxide films, Journal of Applied Physics 112, 103306 (2012)
E. Schüngel, D. Eremin, J. Schulze, T. Mussenbrock, U. Czarnetzki, The Electrical Asymmetry Effect in Geometrically Asymmetric CCRF Discharges, Journal of Applied Physics 112, 053302 (2012)
M. Shihab, D. Ziegler, R.P. Brinkmann, Fast kinetically self-constistent simulation of RF modulated plasma boundary sheaths, Journal of Physics D: Applied Physics 45, 185202 (2012)

2011

M. Lapke, J. Oberrath, C. Schulz, R. Storch, T. Styrnoll, P. Awakowicz, R.P. Brinkmann, T. Mussenbrock, T. Musch, I. Rolfes, and C. Zietz: The Multipole Resonance Probe: Characterization of a Prototype, Plasma Sources Science and Technology, (2011) 042001
P. Mertmann, D. Eremin, T. Mussenbrock, R.P. Brinkmann, P. Awakowicz, Fine-sorting one-dimensional particle-in-cell algorithm with Monte-Carlo collisions on a graphics processing unit, Computer Physics Communications 182, 2161 (2011)
W. Michaeli, Ch. Hopmann, F.von Fragstein, K. Bahroun, H. Behm, Investigations on the influence of hygroscopic surfaces on the plasma-assisted modification of polyamide, Surface and Coatings Technology 205, 506 (2011)
Rastgoo Lahrood, T. de los Arcos, M. Prenzel, A. von Keudell, J. Winter, X-ray photoelectron spectroscopy on implanted argon as a tool to follow local structural changes in thin films, Thin Solid Films 520, 1625 (2011)
T. Reeswinkel, D. G. Sangiovanni, V. Chirita, L. Hultman, J.M. Schneider, Structure and mechanical properties of TiAlN–WNx thin films, Surface and Coatings Technology 205, 4821 (2011)
J. Schulze, E. Schüngel, U. Czarnetzki, M. Gebhardt, R.P. Brinkmann, T. Mussenbrock, Making a geometrically asymmetric capacitive rf discharge electrically symmetric, Applied Physics Letters 98, 031501 (2011)

2010

S. Theiss, N. Bibinov, N. Bagcivan, M. Ewering, P. Awakowicz, K. Bobzin, Time resolved optical emission spectroscopy of an HPPMS coating process, Journal of Physics D: Applied Physics 43, 075205 (2010)

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